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SK resonac

About the Company

SK resonac, which is a joint venture established with Japan's Resonac, is growing into a leader in the semiconductor etching gas area by localizing high-level etching gases that are highly dependent on imports and enhancing domestic technological independence.

SK resonac has built a stable supply chain of high purity etching gases based on the only synthesis process-based CH3F and HBr production facilities in Korea and is striving to develop and produce various etching gases based on its accumulated technologies and capabilities to provide solutions to various needs of customers.
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SK resonac, which produces and sells etching gases that form fine and uniform circuits in semiconductors, aims to become a leading supplier in the etching gas industry based on its accumulated technologies and capabilities.

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Among the various etching gases, SK resonac’s portfolio is focused on high-precision gases,such as Monofluoromethane (CH3F), hexafluorobutadiene (C4F6), and difluoromethane (CH2F2).In the future, SK resonac will also provide more diverse etching solutions.

CH3F(모노플루오르메탄), C4F6(육불화부타디엔), CH2F2(디플루오르메탄), CHF3(트리플루오르메탄), ETC(기타) Dry Etching(→) 식각 공정 전 → 식각 공정 후

Etching gases etch the shape of a space for circuit in the semiconductor prior to the circuit formation of semiconductor. They are in high demand as they are essential in achieving greater precision in 3D structures.

  • MonofluoromethaneCH3F

    CH3F, an etching gas for nitride films in 3D NAND flash memory devices, is becoming more widespread with the increase of 3D NAND use. SK materials is the first and only manufacturer of CH3F in Korea.

  • HexafluorobutadieneC4F6

    C4F6 is used in the etching of oxide films for miniaturized DRAMs and 3D NAND flash memory devices. C4F6 has seen a significant increase in demand.

  • DifluoromethaneCH2F2

    CH2F2, along with CH3F, is a gas used in etching nitride films in NAND flash memory devices. It has been widely utilized since 3D NAND has been increasingly used in the recent.

  • Hydrogen bromideHBr

    HBr is a gas used in semiconductor etching processes. It has excellent precision / vertical etching capabilities, whose usage is increasing due to the sophistication of semiconductors.