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Precursor

SK materials manufactures and sells precursors based on consistent research
and development on specialized materials for next-generation processes.

SK materials

SK materials is developing next-generation materials of the highest quality such as Zr-precursor, Si-precursor, and Ti-precursor. SK materials, the Global No. 1 special gas company, will faithfully play its role as a major growth engine in the future through the integrated pre-cursor technology of Japan's Tri Chemical Laboratories based on the trust and customer responsiveness it has accumulated in the semiconductor material market.

Zr-프리커서, Si-프리커서, Ti-프리커서, Hf-프리커서, 기타 Dry -> 증착 전 -> 증착 후

Precursors, which induce chemical reactions by introducing various types of reactive gases into reactors during semiconductor fabrication, are used to deposit thin films of desired materials is expected with the refinement of semiconductors and the increase in layered structures.

  • Zr-Precursor

    Zr-precursors are used in the manufacturing of capacitors for semiconductor DRAMs and in the depositing of ZrO2 thin films in the ALD process.

  • Si-Precursor

    Si-precursors are used in the manufacturing of semiconductor DRAMs and 3D-NAND and in the depositing SiO2 thin films in the CVD/ALD process.

  • Ti-Precursor

    Ti-precursors are used in the manufacturing of capacitors for semiconductor DRAMs and in the depositing TiO2 thin films in the ALD process.

  • Hf-precursor

    Used in the fabrication process of DRAM capacitors for semiconductor devices. Also used in HfO2 thin-film deposition as part of the ALD process.